The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 1986
Filed:
Feb. 10, 1984
Applicant:
Inventors:
Steven G Eaton, Palo Alto, CA (US);
Graham J Siddall, Woodside, CA (US);
Assignee:
Varian Associates, Inc., Palo Alto, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378205 ; 2504911 ;
Abstract
Provided is an apparatus for improving alignment accuracy by distorting in a controlled manner an X-ray lithographic mask to compensate for mask distortions induced primarily by thermally induced clamping effects in E-beam and X-ray exposure systems. A system of additional alignment sensors is used to provide localized misalignment information. This information is then used to provide feedback to a servo system which in turn activates electromechanically translatable clamps which distort the X-ray mask so as to minimize misalignment over the exposure field.