The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 1986
Filed:
Sep. 28, 1984
Applicant:
Inventors:
Susumu Takahashi, Tokyo, JP;
Kiwami Horiguchi, Tokyo, JP;
Assignee:
Tokyo Kagaku Kikai Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
354 62 ;
Abstract
Exposure control system for ophthalmic photographing apparatus including a focusing mark projecting optical system for projecting focusing mark on a patient's eye so that the focusing condition can be clearly recognized. A detector is provided for detecting the intensity of the light from the mark image. The signal from the detector is used to control the exposure control system by for example determining the time in which the photographing light source is energized.