The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 1986
Filed:
Mar. 12, 1985
Applicant:
Inventors:
Hiroshi Takahashi, Kanagawa, JP;
Hiroyuki Tamaki, Kanagawa, JP;
Chikashi Ohishi, Kanagawa, JP;
Keisuke Shiba, Kanagawa, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ;
U.S. Cl.
CPC ...
430303 ; 430272 ; 430961 ; 430950 ; 430532 ; 430327 ; 430494 ; 430937 ; 430271 ;
Abstract
A process for producing a light-sensitive lithographic plate requiring no dampening solution comprising (1) carrying out corona discharge treatment on the surface of a silicone rubber layer of a light-sensitive lithographic plate requiring no dampening solution wherein the silicone rubber layer is the top layer, (2) spraying a solution or dispersion containing a non-volatile solid component on said silicone rubber layer, and (3) drying to provide fine projection patterns on said silicone rubber layer.