The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 1986

Filed:

Nov. 29, 1984
Applicant:
Inventors:

Larry A Harrah, Albuquerque, NM (US);

John M Zeigler, Albuquerque, NM (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430326 ; 430269 ; 430270 ; 430322 ; 430329 ; 430330 ; 430323 ; 430311 ; 528 25 ; 528 30 ; 528 33 ; 556430 ;
Abstract

New polysilane copolymers comprise recurring units of --Si(X)(Y)-- and Si(A)(B)--, Si(X)(Y) being different from Si(A)(B), wherein


Find Patent Forward Citations

Harrah, Larry. (1986). Method of using polysilane positive photoresist materials (U.S. Patent No. 4587205). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4587205

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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