The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 1986
Filed:
Apr. 19, 1984
Applicant:
Inventors:
Shohei Nakamura, Fuji, JP;
Yoshimasa Tuji, Fuji, JP;
Assignee:
Asahi Kasei Kogyo Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B / ; G03C / ; G03C / ; G03C / ;
U.S. Cl.
CPC ...
430 14 ; 430 18 ; 430252 ; 430260 ; 430262 ; 430256 ; 430258 ; 430271 ; 430284 ; 156660 ; 51310 ; 51311 ; 51312 ;
Abstract
A mask element for selective sandblasting comprising a support film layer and, superimposed thereon in the following order, a retainer film layer of a water-insoluble cellulose derivative and a photoresist layer of a pattern mask, said photoresist layer of pattern mask being adapted to adhere to the surface of an article body to be engraved with a strength such that the mask is not detached therefrom during sandblasting. By the use of the mask element of the present invention, a pattern exactly corresponding to that of the mask, even if it is very fine, can be engraved on an article body nicely.