The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 1986
Filed:
Jun. 07, 1984
Brigitte Schneider-Gmelch, Munich, DE;
Joseph Mathuni, Munich, DE;
Siemens Aktiengesellschaft, Berlin & Munich, DE;
Abstract
A method for manufacturing structures having dimensions in a range of 1 .mu.m and below in a layer of material by applying an auxiliary layer consisting of metal or metal oxide on the layer to be structured and utilizing a lacquer mask to structure the auxiliary layer to form a mass therein for the etching of the layer to be structured, characterized by passivating the auxiliary layer by applying a protective layer to prevent oxidizing of the auxiliary layer until a desired time. The protective layer can be gold or platinum and the auxiliary layer can be selected from a group consisting of titanium, hafnium, zirconium, vanadium, chromium, manganese, aluminum, niobium and tantalum. The method is particularly useful to manufacuture absorber structures of X-ray masks that are used in microelectronics.