The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 1986

Filed:

Feb. 04, 1982
Applicant:
Inventor:

Patrick J Reilly, Akron, OH (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ;
U.S. Cl.
CPC ...
522116 ; 522120 ; 522124 ; 522125 ; 522903 ; 522912 ;
Abstract

A method of reducing the monomer content of a polymer or polymerization media comprising subjecting the polymer containing the monomer to sufficient irradiation with a high energy radiation to polymerize said monomer, said radiation preferably occurring in presence of chemical agent that accelerate the rate of consumption of the undesirable monomer, i.e. the monomer considered hazardous and/or protects the polymer from radiation degradation.


Find Patent Forward Citations

Reilly, Patrick. (1986). Monomer removal from a polymer (U.S. Patent No. 4585808). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4585808

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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