The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 1986
Filed:
Jul. 06, 1984
Applicant:
Inventors:
Nobuhisa Kitagawa, Tokyo, JP;
Masataka Hirose, Hiroshima, JP;
Kazuyoshi Isogaya, Tokyo, JP;
Yoshinori Ashida, Higashi-Hiroshima, JP;
Assignee:
Mitsui Toatsu Chemicals, Incorporated, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 541 ; 427 36 ; 427 531 ;
Kitagawa, Nobuhisa. (1986). Formation process of amorphous silicon film (U.S. Patent No. 4585671). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4585671
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile