The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 1986
Filed:
Nov. 01, 1983
Applicant:
Inventors:
Katsumi Kanda, Kudamatsu, JP;
Katsunobu Kunimoto, Yamaguchi, JP;
Keiji Yamane, Kudamatsu, JP;
Yoshikazu Kondo, Kudamatsu, JP;
Assignee:
Toyo Kohan Co., Ltd, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D / ; C25D / ;
U.S. Cl.
CPC ...
204 27 ; 204 34 ; 204 381 ; 204 387 ; 204 40 ; 204 41 ;
Abstract
A method for producing a metal substrate for a lithographic plate is provided herein by treating the substrate having the thickness in the range of 50 to 400 .mu.m. The said substrate is electrochemically, chemically or mechanically treated in order to provide an average surface roughness in the range of 0.1 to 3 .mu.m, followed by a surface treatment such as plating or chemical treatment, and then followed by a conventional hydrophilic treatment.