The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 1986
Filed:
Feb. 14, 1985
Masaaki Yoshino, Kobe, JP;
Tsutomu Nanao, Kobe, JP;
Kanegafuchi Kagaku Kogyo Kabushiki Kaisha, Osaka, JP;
Abstract
Preparation of an amorphous silicon semiconductor by glow discharge decomposition in an atmosphere containing a silicon compound in a glow discharge decomposition chamber which has a radio frequency electric field and a magnetic field crossing the electric field at right angles and in which the substrate is arranged substantially at right angles to the electric field. The amorphous silicon thin layer has excellent characteristics, particularly an excellent photoconductivity, can be prepared at a high rate of film formation, and also an amorphous semiconductor PIN homo- or hetero-junction photovoltaic device prepared according to the process of the invention has excellent characteristics.