The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 1986
Filed:
Feb. 27, 1985
Applicant:
Inventors:
Kazumasa Fujioka, Ibaraki, JP;
Sumio Okuno, Kudamatsu, JP;
Muneo Mizumoto, Tsuchiura, JP;
Hideaki Kamohara, Ibaraki, JP;
Shinjiro Ueda, Abiko, JP;
Takao Kuroda, Kokubunji, JP;
Sumio Yamaguchi, Tokyo, JP;
Naoyuki Tamura, Kudamatsu, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C / ;
U.S. Cl.
CPC ...
118500 ; 118725 ; 118730 ; 156D / ;
Abstract
A rotary substrate holder of a molecular beam epitaxy apparatus including leads-cum-posts serving both as leads for passing a current to a heater for heating a substrate and as posts for supporting the heater. By this arrangement, heat transferred from the heater to a bearing disposed in the vicinity of the heater is minimized in amount, thereby prolonging the service life of the holder and minimizing a heat loss thereof.