The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 1986
Filed:
Sep. 24, 1984
Applicant:
Inventors:
Chung P Park, Pickerington, OH (US);
James T Grimes, Newark, OH (US);
Assignee:
The Dow Chemical Company, Midland, MI (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ; C08J / ;
U.S. Cl.
CPC ...
264 53 ; 264D / ; 264D / ; 425 / ;
Abstract
Low density expanded polystyrene is obtained by extended exposure of particles to atmospheric steam and aging the particles in air. Particles have wrinkled cell walls.
Park, Chung. (1986). Method for obtaining low densities with particulate expandable (U.S. Patent No. 4579701). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4579701
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile