The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 1986
Filed:
Mar. 03, 1983
Horst H Schwieker, Hamburg, DE;
Kurt Gieschen, Hamburg, DE;
U.S. Philips Corporation, New York, NY (US);
Abstract
The invention relates to diaphragm means arranged close to the film in an X-ray spot film device. The diaphragm means comprises a first diaphragm with several rectangular aperture sections. The sections are displaced in the horizontal direction and have different vertical dimensions. A second diaphragm assembly has vertically extending diaphragm edges. By moving the first diaphragm to different positions in the radiation path, the aperture can be adapted to exposure formats of different vertical dimensions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile