The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 1986

Filed:

Dec. 14, 1984
Applicant:
Inventors:

Noriaki Emura, Yamaguchi, JP;

Takashi Ariyoshi, Yamaguchi, JP;

Toshikazu Kato, Yamaguchi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C / ; C09B / ;
U.S. Cl.
CPC ...
526204 ; 526295 ; 526222 ;
Abstract

A chloroprene polymer is produced by aqueous emulsion polymerization in the presence of a cyclic polysulfide compound which is employed in a quantity equal to at least 0.1% by weight of the weight of the chloroprene, followed by deflocculating the polymer.


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Emura, Noriaki. (1986). Process for producing a chloroprene polymer (U.S. Patent No. 4577004). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4577004

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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