The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 1986
Filed:
Mar. 12, 1985
Applicant:
Inventors:
Eugene Golda, Monsey, NY (US);
Alan Wilkes, Brewster, NY (US);
Assignee:
Polychrome Corporation, Yonkers, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ;
U.S. Cl.
CPC ...
430157 ; 430154 ; 430163 ; 430168 ; 430302 ; 430309 ; 430327 ; 430494 ; 430945 ; 430942 ;
Abstract
A presensitized plate adapted for use in lithography comprising a support member with a metal surface, e.g. aluminum metal, and overlying layer containing a diazo compound. In accordance with this invention, the relative exposure sensitivity of the diazo compound is improved by pretreatment to accelerate its reactivity in the presence of actinic light. One method of pretreatment involves preheating the diazo compound to a temperature above about 35.degree. C. up to about 120.degree. C. The improved lithographic plate and the process of preparing plate are claimed.