The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 1986
Filed:
Sep. 28, 1984
Dieter Frank, Naperville, IL (US);
Lincoln D Metcalfe, La Grange, IL (US);
John Y Park, Naperville, IL (US);
Akzona Incorporated, Enka, NC (US);
Abstract
A process for the removal of impurities comprising amides from a solution comprising nitriles and the impurities. A reaction mixture is formed which includes the solution, a layered mineral comprising aluminum silicates having exchangeable alkaline or alkaline earth cations on the surfaces of the layers and an acid which has an acid strength sufficient to protonate the amides at amide protonation conditions, but in which the solubility of the salt of the acid and exchangeable cation at those conditions is such that the equilibrium of the protonation reaction is substantially in the direction of the amides remaining in a protonated form. The water content of the reaction mixture must be less than about 0.5 wt. % for substantially all of the reaction time. The reaction mixture is maintained for a sufficient time at the amide protonation conditions for protonation of the amides and exchange of the protonated amides and exchangeable cations to occur, the protonated amides adhering to the surfaces of the layers. Nitriles having a reduced content of impurities may then be separated from the reaction mixture. Effective means of separation are rotating drum vacuum filters, preferably two in series.