The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 1986

Filed:

Dec. 04, 1984
Applicant:
Inventor:

Carl R Bothner, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G / ; G03G / ;
U.S. Cl.
CPC ...
355 / ; 355 / ; 355 15 ; 355 / ;
Abstract

In an electrographic copier wherein discrete dielectric sheets are moved seriatim about a travel path having a portion in juxtaposition with a developer station for developing imagewise electrostatic charge patterns on such sheets with developer material, apparatus for selectively sealing developer material within such station and, during such sealing, guiding a moving sheet along such travel path portion out of developing relation with such developer material. The apparatus comprises a member selectively movable to a first position sealing developer material within the developer station and forming a sheet guide coincident with the sheet travel path portion, or a second position remote from such first position. In response to the lead edge of a discrete dielectric sheet moving away from the travel path portion, the member is moved to its second position leaving the sheet in developing relation to developer material in the developer station; and in response to the trail edge of such sheet moving into the travel path portion, the member is moved to its first position to seal developer material within such station and to guide such sheet along such travel path portion out of developing relation to developer material.


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