The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 1986

Filed:

Jun. 15, 1984
Applicant:
Inventors:

Cheng-Yi Cheng, Kao Hsiung City, TW;

Shou-Yuan Lee, Kao Hsiung City, TW;

Kwang-Ming Chen, Kao Hsiung City, TW;

Chee-Yuan Wo, Kao Hsiung City, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
525252 ; 525253 ; 525256 ; 525260 ; 525263 ; 525276 ; 525317 ;
Abstract

This invention relates to a method for graft-copolymerizing vinyl chloride monomer to a polyfluorine resin to produce resins of improved physical properties and processability parameters. The vinyl chloride monomer and polyfluorine resin are first treated in a highly alkaline medium and at a high temperature, and the mixture is stirred. Suspension agent(s), water and an initiator are added to the mixture after the temperature thereof has been lowered. The resultant mixture which has been stirred and homogenized is heated to a temperature at which polymerization is completed. Thereafter the mixture is neutralized, washed, and dried. A product having improved impact strength and resistance to heat and abrasion results.


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