The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 1986
Filed:
Mar. 03, 1983
Joel P Covey, Madison, WI (US);
Allen J Zerbel, Madison, WI (US);
Other;
Abstract
A system for supporting and spatially orienting an optical element within an analytical instrument, the instrument being of the type having a source of analytical radiation and optical elements for directing the radiation through the instrument. A planar base is secured within the instrument while a support plate carries an optical element to be supported within the instrument. A member spaces one support plate portion from the base while allowing a spatial reorientation of the support plate around the spaced support plate portion. First and second point contact systems adjustably space different support plate portions from the base. The support plate is resiliently biased toward the base with the adjustable point contacts establishing the spacial orientation of the support plate, and thus the optical element, relative to the base. In a preferred embodiment, a spherical pivot spaces the one support plate portion from the base while cooperating cylindrical and conical members establish the first and second point contacts for support plate reorientation. This system also prevents rotation of the support plate relative to the base.