The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 1986
Filed:
Jun. 06, 1983
Applicant:
Inventors:
Tsuyoshi Saigo, Tokyo, JP;
Akira Kitani, Fussa, JP;
Assignee:
Hoya Lens Corporation, Tokyo, JP;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02C / ; G02C / ;
U.S. Cl.
CPC ...
364413 ; 3317 / ; 5128 / ; 351178 ;
Abstract
A method for determining the optimum thickness of an ophthalmic lens comprises the steps of applying data indicative of the kind of a lens suitable for a spectacle wearer and the contents of a prescription as inputs to a computer, executing necessary computation by the computer according to a predetermined program on the basis of the various input data thereby drawing a map of an equi-thickness line group of the ophthalmic lens on the basis of the result of computation, and placing a spectacle frame at a predetermined position on the map of the equi-thickness line group to find out the outermost equi-thickness line within the extent of the frame.