The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 1986
Filed:
Aug. 26, 1982
Gerry L Auth, Laguna Beach, CA (US);
MIDAC Corporation, Costa Mesa, CA (US);
Abstract
An optical system is disclosed which significantly enhances the throughput of a grating spectrometer intended to determine impurity concentrations on the surface of semiconductor materials (usually single crystal silicon) used for integrated circuits. The system, which uses a laser beam as the photo-excitation means impinging on a Dewar-contained sample, includes a pre-sample series of lenses which so shapes the laser beam that its shape at the point of impingement on the sample is proportionally similar to the shape of the monochromator slit in the spectrometer. The same lens which provides final focusing of the laser beam on the sample also collects the sample-emitted radiation, which is thereafter focused by suitable optics on the monochromator slit, where it preferably substantially matches the shape of the slit, but slightly overfills the slit.