The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 1986
Filed:
Dec. 19, 1983
Tor W Moksvold, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The method suggests the replacement of all or part of the solid or blanket buried region, typically a subcollector region of a bipolar transistor, by a mesh or stripe shaped subcollector. During subsequent thermal processing involving growth of the epitaxial layer, the stripes will at least partially merge, resulting in a solid subcollector. The method of minimizing autodoping implies only a special design of the subcollector mask. Therefore, there is no longer any need for technological changes either in the process or in the equipment. The method also applies to other buried layers, such as, subemitters, resistors, bottom isolation regions, etc.