The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 1986
Filed:
Nov. 29, 1982
Hisajiro Osada, Tokyo, JP;
Yutaka Hiratsuka, Yokohama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma monitor which measures the distribution of particular chemical species (atom, molecule, ion) in plasma generated inside an instrument making use of the plasma. Laser light having a particular wavelength is radiated to the particular chemical species so as to let it generate fluorescence. The fluorescence is picked up for each of a plurality of zones divided in the radiating direction of the laser light and the construction of the chemical species in each zone is determined on the basis of the intensity of the fluorescence in each zone in order to determine the concentration distribution of the particular chemical species contained in the plasma. The operative condition within the sealed vessel can be grasped more accurately by measuring the distribution of the concentration of the chemical species which is closely related with the condition of deposition or etching.