The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 1986

Filed:

Dec. 28, 1983
Applicant:
Inventors:

Kevin T Hankins, Palm Bay, FL (US);

Anthony L Rivoli, Palm Bay, FL (US);

Assignee:

Harris Corporation, Melbourne, FL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
33 / ; 33547 ; 33533 ;
Abstract

A pattern for determining dimensions of projected or printed figures is provided having individual scaling figures therein on a mask or template. Dimensional measurement may be indicated by alignment of opposing edges of scaling figures offset from each other along the corresponding axis of alignment. Reference marks may be provided on the pattern and associated with each possible axis of alignment for indicating an absolute dimension of a concurrently projected or printed figure. To conserve space, the pattern may be 'densepacked' with scaling figures such that each scaling figure includes a plurality of opposing edges, each alignable along a different axis in response to different levels of dimensional distortion.


Find Patent Forward Citations

Hankins, Kevin. (1986). Critical dimension measurement structure (U.S. Patent No. 4566192). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4566192

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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