The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 1986
Filed:
Feb. 27, 1985
Applicant:
Inventors:
Shohei Inoue, Tokyo, JP;
Takuzo Aida, Tokyo, JP;
Koichi Sanuki, Tokyo, JP;
Masahide Ishikawa, Tokyo, JP;
Assignee:
Hitachi Chemical Company, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ;
U.S. Cl.
CPC ...
525 25 ; 525437 ; 525438 ; 528274 ; 528282 ; 528286 ; 528297 ;
Abstract
Polyesters having a narrow molecular weight distribution and block copolymers having a narrow molecular weight distribution obtained from said polyesters can be produced by using a catalyst system comprising an aluminum porphyrin complex and an organic quaternary salt under mild reaction conditions.
Inoue, Shohei. (1986). Process for producing polyester and block copolymer thereof (U.S. Patent No. 4565845). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4565845
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile