The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 1986
Filed:
Oct. 25, 1983
Yuji Fukuda, Yokohama, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
An apparatus for developing a resist film coated on a rotatable base plate, comprising means for supporting and rotating the base plate and nozzle means for feeding a developer onto the resist film. The nozzle means comprises a nozzle arm extending over the base plate and having a plurality of nozzles arranged along the length of the nozzle arm. Disclosed also is a method for developing a resist film coated on a rotatable base plate with a developer fed from a plurality of nozzles arranged on a nozzle arm along the length of the nozzle arm. The method comprises feeding the developer from th respective nozzles onto the resist film while rotating the base plate and while scanning the nozzle arm over the resist film.