The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 1986

Filed:

Feb. 15, 1984
Applicant:
Inventors:

Wilfried Hofmann, Taufkirchen, DE;

Herbert Lusch, Taufkirchen, DE;

Walter Rauffer, Steinebach, DE;

Eberhard Zieran, Grunwald, DE;

Jurgen Sylla, Sauerlach-Arget, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
353 55 ; 353 77 ;
Abstract

An apparatus for sensing microfilms is provided in addition to visible light with a projection lamp for radiating infrared rays which pass through a cold-light mirror to a platform on which a microfilm is disposed. The apparatus is further provided with a projection lens positioned above the microfilm platform. The path of rays is directed from the microfilm platform through the projection lens and then is projected onto an image screen or other sensing surface, for example CCD-device. For adjusting the apparatus for various light spectrum combinations the apparatus is provided with at least one infrared component-reflecting mirror which is displaceable or pivotable to and from the path of illumination rays radiated from the projection lamp.


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