The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 1985
Filed:
Sep. 28, 1984
Hajime Kakumaru, Hitachi, JP;
Nobuyuki Hayashi, Hitachi, JP;
Hitachi Chemical Company, Ltd., Tokyo, JP;
Abstract
Photosensitive composition comprising (a) an addition polymerizable compound of the general formula: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are hydrogen atom or methyl group, and n+m=8 to 12, (b) an addition-poymerizable compound of the general formula: ##STR2## wherein Z is a cyclic dibasic acid residue, R.sup.5 is a C.sub.1 to C.sub.3 alkylene group, R.sup.6 is hydrogen atom or methyl group, and R.sup.7 is hydrogen atom, methyl group, ethyl group or CH.sub.2 X in which X is chlorine atom or bromine atom, (c) a photoactivatable polymerization initiator, and (d) a linear copolymer having a carboxy content of 17 to 50% by mole, a water absorption of 4 to 30% by weight and a weight average molecular weight of 30,000 to 400,000. Photosensitive laminate having a photosensitive layer formed from the composition has an excellent resistance to plating liquids as well as excellent etching resistance, chemical resistance, adhesion property to boards and developing property.