The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 1985

Filed:

Sep. 16, 1983
Applicant:
Inventor:

Gunter Meier, Karlsruhe-Durlach, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05C / ; D05B / ;
U.S. Cl.
CPC ...
1122661 ; 112439 ; 112454 ;
Abstract

A sewn pattern arrangement is produced by a zig zag sewing machine in a workpiece, within the range of a modular pattern length and width. Individual elementary patterns are sewn which are formed by several stitches and are preferably of the cross-stitch type and extend each only over a fraction of the modular pattern width. This makes it possible to sew elementary patterns at various locations within the provided range of widths, so that a variety of optically impressive designs may be produced by sewing pattern rows in a desired configuration. The respective final stitch of a pattern element forms the first stitch of the subsequent one, so that jump stitches between elementary patterns are avoided. Large-area patterns may be obtained by grouping rows of pattern elements side by side.


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