The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 1985
Filed:
Aug. 22, 1983
Applicant:
Inventors:
Wolfgang Knauer, Malibu, CA (US);
Walter E Perkins, Jr, Redding, CA (US);
Assignee:
Hughes Aircraft Company, El Segundo, CA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
2503 / ; 250398 ; 2504922 ;
Abstract
Electron or ion beam shaping apparatus has first aperture (28) and second aperture (30) through which the beam (20) is focused by first lens (24). Double deflection apparatus of either electromagnetic or electrostatic character is small and can be positioned between the aperture plates so that the image of both apertures can be focused on the target (16). Double deflection serves to vary spot size and shape and assures that target current density does not change while spot size is varied.