The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 1985
Filed:
Mar. 25, 1983
Applicant:
Inventors:
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430312 ; 430322 ; 430325 ; 430326 ; 430330 ; 427 41 ;
Abstract
Fine resist patterns having high sensitivity and steeply improved residual film ratio is obtained by forming a multilayer film consisting of organic substances on a substrate, making at least one layer other than the lowest layer of said multilayer film contain metal elements, irradiating said multilayer film with light or radiations, and developing with plasma.
Kokaku, Yuuichi. (1985). Method for forming fine multilayer resist patterns (U.S. Patent No. 4560641). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4560641
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