The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 1985
Filed:
Sep. 19, 1983
Jonathan J Kim, Williamsville, NY (US);
Viswanathan Venkateswaran, Grand Island, NY (US);
Kennecott Corporation, Cleveland, OH (US);
Abstract
A process for sintering or reaction sintering ceramic or refractory materials with hot plasma gases. The hot plasma gases are produced by injecting a combined primary plasma arc with a secondary gas stream directly into a reaction furnace. The secondary gas stream is tangentially injected into the primary plasma arc gas stream to mix the gases for the required sintering temperature at the highest energy efficiency. The plasma torches are positioned in the furnace ports so that the plasma gas flow is perpendicular to the furnace process gas flow. This process is inexpensive and efficient and results in a superior quality sintered product. It may be adapted to continuous or periodic kilns to achieve a high furnace productivity.