The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 1985
Filed:
Jun. 27, 1984
Warren B Kirsch, Baton Rouge, LA (US);
Sebastian M Laurent, Greenwell Springs, LA (US);
Ethyl Corporation, Richmond, VA (US);
Abstract
A process for the removal of hydrogen halides including HCl and HF, and/or sulfur dioxide from silicon tetrafluoride. Contaminated gaseous silicon tetrafluoride is passed through a column of zeolite preferably in the hydrogen cation form so as to permit recovery of silicon tetrafluoride containing less than about 10% of the original contamination levels. Acid-stable zeolite materials suitable for the process of the invention are subjected to a flow of hot gases to permit regeneration of the column for use in a semicontinuous process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile