The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 1985
Filed:
Jul. 28, 1983
John H Keller, Newburgh, NY (US);
James R Winnard, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An apparatus capable of simultaneous focusing, positioning, and scanning of an ion beam is described. The apparatus uses metallic elements to form the sides of an open-ended substantially box-shaped structure. Application of AC and DC currents to the four corners of the structure create AC and DC fields within the structure that deflect an ion beam so as to perform the functions of positioning, focusing, and scanning. The center of focusing of the ion beam is placed closer to the center of scanning of the ion beam than in conventional ion beam deflection systems. As a result, the tendency of space charge beam blow-up during scanning is greatly diminished. By combining the functions of positioning, focusing, and scanning in one deflection element, the length of an ion beam deflection system is reduced, and the current capability is greatly increased.