The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 1985
Filed:
Dec. 02, 1983
Ulrich Schleicher, Hersbruck, DE;
Diehl, GmbH & Co., Nuremberg, DE;
Abstract
An arrangement for reducing the base drag in projectiles constructed pursuant to the high-low pressure system including a gas-generating charge, a chamber with a pressure-reducing component, and a discharge aperture provided in the base wall. In the arrangement for the reduction of the base drag in projectiles, the charge is annularly shaped, the pressure-reducing component is formed as a tube axially extending through the charge and possesses a multiplicity of nozzles. Through the provision of the large number or multiplicity of nozzles, the tube, which separates the high-pressure space from the low-pressure space, a relatively gentle gas jet exits from the bottom of the projectile. For this purpose, of significance is the swirling of the individual gas jets in the low-pressure space in accordance with the principle of the countercurrent process. The vacuum in the region of the projectile base is reduced to a minimum due to the gentle jet.