The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 1985

Filed:

Jan. 30, 1984
Applicant:
Inventors:

Yasuhiro Hayashi, Kanagawa, JP;

Naoyasu Deguchi, Kanagawa, JP;

Hiroyuki Yamagami, Kanagawa, JP;

Kensuke Goda, Kanagawa, JP;

Kazunori Hasebe, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430567 ; 430564 ; 430600 ; 430611 ; 430379 ; 430504 ; 430505 ; 430407 ; 430508 ;
Abstract

A color reversal photographic light-sensitive material is disclosed. The material is comprised of a support base having thereon a silver halide emulsion layer, an organic compound and colloid grains of a metal or metal sulfide or silver halide grains the surface of which is previously fogged. The silver halide emulsion layer includes fine grains of silver halide particles having a particle size of 0.3.mu. or less. The fine grain particles are present in the emulsion in an amount in the range of about 30% to about 95% based on the total number of silver halide grains in the emulsion. The silver halide emulsion also includes coarse grains having a particle size of more than 0.3.mu.. The organic compound has a solubility product constant of 10.sup.-14 or less when forming a salt with a silver ion. By utilizing the organic compound in combination with the particular fine grain silver halide particles it is possible to obtain a material which has improved tone reproduction properties in high exposure areas and also provide a material with a wide exposure lattitude.


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