The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 1985
Filed:
Mar. 15, 1984
Toshiaki Shibue, Hino, JP;
Koichi Nagayasu, Hino, JP;
Konishiroku Photo Industry Co., Ltd., Tokyo, JP;
Abstract
Disclosed is a method of producing a support for a photographic paper, which comprises applying primary irradiation of electron beams to at least one coated layer formed on one side or both sides of a substrate and curable by irradiation of electron beams, bringing the surface of said coated layer into contact with a form member and then peeling it from the form member, followed by applying secondary irradiation of electron beams to the coated layer. The primary irradiation is carried out in the manner that the surface of the coated layer may hold shapes substantially corresponding to shapes on the surface of the form member at the stage where the coated layer has been peeled off from the form member.