The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 1985

Filed:

May. 21, 1984
Applicant:
Inventors:

Ronald G Huggins, Lawrenceville, GA (US);

William D O'Brien, Jr, Lilburn, GA (US);

Fred P Partus, Marietta, GA (US);

Assignee:

AT&T Technologies, Inc., New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ;
U.S. Cl.
CPC ...
210749 ; 210752 ; 210754 ; 210150 ; 210199 ; 210206 ; 422211 ; 422194 ; 422231 ;
Abstract

An open end (61) of a tube (62) is disposed below a free surface of a treating solution (60) which is capable of reacting with a liquid effluent to provide a disposable reaction product. A pressurized gas which is non-reactive with the effluent and with the treating solution causes the effluent to be moved through the tube and discharged into contact with the treating solution. Also, the gas is flowed through a shroud (63) disposed concentrically about the tube. The gas envelops the effluent and the shroud prevents contact of the treating material with the effluent and the gas along a predetermined distance beyond the open end of the tube. This arrangement causes the treating material to react with the effluent at a location spaced from the end of the tube thereby preventing clogging of the tube. The discharge of the gas along with the liquid effluent into the treating solution causes a substantial mixing of the two liquids to provide a substantially complete reaction.


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