The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 1985
Filed:
Jun. 14, 1984
Taku Nakamura, Kanagawa, JP;
Yasuo Kasama, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A silver halide photographic light-sensitive material for photomechanical process and a method for the reduction treatment of said light-sensitive material are described. The light-sensitive material comprises a support, at least one light-sensitive silver halide emulsion layer, and at least one light-insensitive upper layer, characterized in that at least one light-insensitive upper layer contains a polymer comprising: (a) a monomer unit containing at least one group having an electric charge; and (b) a monomer unit having a functional group capable of crosslinking through a gelatin hardening agent with a like functional group of another polymer chain of the same type or with gelatin. The light-sensitive material is very advantageous; for example, it has greatly improved reduction treatment suitability, and the reduction treatment suitability is not deteriorated even if the amount of silver coated per unit area is reduced.