The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 1985
Filed:
Mar. 01, 1983
Friedrich Blume, Schwalbach, DE;
Lutz Voigtmann, Ober-Morlen, DE;
Braun Aktiengesellschaft, Kronberg, DE;
Abstract
A method for producing a shear element having protrusions on the skin contacting surface thereof, including the steps of coating an electrically conductive surface with a photoresist, exposing the photoresist to a hold pattern and developing the photoresist to produce a grid pattern wherein the electrically conducting surface is exposed, the grid pattern defining hole areas wherein the electrically conductive surface is covered by islands of photoresist of a predetermined thickness, introducing irregularities into the surface elevation of the exposed grid, the surface irregularities being of lesser dimension of the thickness of the photoresist islands, depositing an intermediate foil onto the exposed grid overlying the introduced surface irregularities, the intermediate foil being of sufficient thickness to extend above the photoresist islands when deposited, depositing a shear foil overlying the intermediate foil, and removing the shear foil from the intermediate foil, thus producing a shear foil having protrusions on the skin contacting surface thereof but having relatively smooth surface in the regions surrounding shear openings corresponding to the locations of the photoresist islands.