The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 1985
Filed:
Aug. 17, 1983
Masashi Ogawa, Minami-Ashigara, JP;
Taku Nakamura, Minami-Ashigara, JP;
Yukihide Urata, Minami-Ashigara, JP;
Shingo Yamauchi, Minami-Ashigara, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A silver halide photographic light-sensitive material for photo-mechanical process comprising a support having thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer which is positioned above the light-sensitive silver halide emulsion layer, wherein at least one of the light-insensitive upper layers has a melting time longer than a melting time of the light-sensitive silver halide emulsion layer and the light-insensitive upper layer contains a polymer latex. The silver halide photographic light-sensitive material has excellent aptitude for reduction treatment without increasing the amount of silver per unit area. The occurrence of reticulation is prevented with the silver halide photographic light-sensitive material. A method of reduction treatment for a silver halide photographic light-sensitive material for photo-mechanical process comprising the steps of: exposing the silver halide photographic light-sensitive material as described above, development processing the exposed silver halide photographic light-sensitive material to form a silver image, and carrying out reduction treatment of the silver image is also disclosed.