The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 1985

Filed:

Nov. 07, 1983
Applicant:
Inventors:

Michael Gulla, Sherborn, MA (US);

Paul Taylor, North Andover, MA (US);

Michael J Oddi, Burlington, MA (US);

Assignee:

Shipley Company Inc., Newton, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03F / ;
U.S. Cl.
CPC ...
430192 ; 430165 ; 430167 ; 430197 ; 430325 ; 430326 ;
Abstract

A photoresist composition comprising a sensitizer in a binder that is a naphthol polymer alone or mixed with another compatible resin such as a novolak resin or a polyvinyl phenol. The use of the naphthol resin as a portion of the binder increases the heat distortion temperature of the photoresist composition.


Find Patent Forward Citations

Gulla, Michael. (1985). Photoresist composition of cocondensed naphthol and phenol with (U.S. Patent No. 4551409). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4551409

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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