The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 1985
Filed:
Feb. 01, 1984
Michael Sellschopp, Hammersbach, DE;
Leybold-Heraeus GmbH, Cologne, DE;
Abstract
The invention concerns equipment for producing coatings having a rotationally symmetric thickness profile on substrates. The equipment comprises an evaporizing cathode and, for each substrate, a mask and a rotatable substrate holder arranged behind the mask. The mask has a cut-away portion such that the desired thickness profile of the coating can be produced by rotating the substrate. According to the invention and for the purpose of increasing the throughput of the equipment while maintaining close tolerances for the thickness profile of the coatings, a plurality of masks (6) and a plurality of substrate holders (13) associated with the masks are provided on a common movable frame (1). The movable frame (1) is displaceable relatively to the evaporizing cathode (10), continuous rotary movement being imparted to the substrate holders.