The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 1985
Filed:
Jul. 14, 1983
Applicant:
Inventors:
Akira Kojima, Machida, JP;
Saburo Yoshida, Atsugi, JP;
Yoshio Yamada, Fukui, JP;
Seiji Shioda, Fukui, JP;
Kazumi Isoshima, Ootsu, JP;
Assignees:
Sony Corporation, all of, JP;
Seiren Co., Ltd., all of, JP;
Asahi Kasei Kogyo Kabushiki Kaisha, all of, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ; B32B / ;
U.S. Cl.
CPC ...
4283155 ; 4283159 ; 4283179 ; 428904 ; 428922 ;
Abstract
A material for clothes is disclosed which is formed of a base cloth and a porous film having a number of very fine pores and coated on at least one surface of the base cloth. In this case, the pores are made to have a diameter about 0.1 to 5 .mu.m and the material has the percentage of dust permeation less than 50% for the dust with size larger than 0.3 .mu.m and moisture permeability more than 2500 g/m.sup.2 /24 hrs.