The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 1985

Filed:

Mar. 04, 1983
Applicant:
Inventors:

Joel P Covey, Madison, WI (US);

D Warren Vidrine, Madison, WI (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
356244 ; 356346 ;
Abstract

An analytical instrument including a source of analytical radiation, a support for a sample to be analyzed, an analytical radiation detector and optical elements for directing the analytical radiation within the instrument including a beam condenser system having elements for focusing the radiation relative to the sample support and the detector and elements for collimating radiation focused relative to the sample support and deflecting it for focusing on the detector. The collimating and deflecting elements are supported for common movement in a first direction with the collimating element being supported for movement, independently of the deflecting element, in a second direction orthogonal to the first direction. The collimating and deflecting elements may each be reflecting elements or the collimating element may be a refracting element. The sample support may be movable in two directions coordinated with the directions of movement of the collimating and deflecting elements and may be adapted to accept an ATR crystal. The sample support and beam condenser system may be contained in a dedicated sample compartment with the movement(s) of the collimating and deflecting elements compensating for differences in the thickness of samples supported by the sample support and for differences in optical path to and from a sample supported by the sample support.


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