The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 1985

Filed:

Sep. 02, 1983
Applicant:
Inventor:

Harold E McKelvey, Plymouth, MI (US);

Assignee:

Shatterproof Glass Corporation, Detroit, MI (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041 / ; 204298 ;
Abstract

In the operation of sputtering targets, whether the targets are planar or cylindrical, magnetically enhanced or not, they are provided with a detectable material underlying the coating material carried on the target. As the target becomes depleted, the underlying material becomes deposited on the substrate and is then detected when appearing on the substrate. The detectable material can be a radioactive substance, an electrical characteristic detectable substance such as iron, an optically detectable substance such as copper or gold which is highly reflective, or a fluorescent substance. The target may have a thinner section of coating material immediately above the detectable material or the detectable material may be deeply imbedded in the target where the target is a solid substance and is water cooled from the opposed surface.


Find Patent Forward Citations

Loading…