The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 1985
Filed:
Sep. 02, 1983
Mao-Jin Chern, Rancho Palos Verdes, CA (US);
Ronald T Smith, Redondo Beach, CA (US);
John W Peters, Malibu, CA (US);
Hughes Aircraft Company, El Segundo, CA (US);
Abstract
A process for depositing on the surface of a substrate a layer of a chosen material having continuous gradations in refractive index in a predetermined periodic pattern. The substrate is exposed to two vapor phase reactants which react upon radiation-inducement to produce the chosen material, and the relative proportion of the reactants is varied in a predetermined and continuous sequence to produce continuous gradations in the stoichiometric composition and refractive index of the deposited layer as a function of thickness. Additionally, predetermined changes in refractive index and/or thickness across the horizontal surface of the substrate may be produced in combination with the change in refractive index as a function of thickness. Diffraction optical elements formed by such a process include various optical filters and reflective optical coatings.