The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 1985
Filed:
Jan. 27, 1984
Robert P Bisey, Seaford, NY (US);
Other;
Abstract
A support device for supporting first and second units has an instrument platform having first and second spaced opposite parallel planar surfaces. The instrument platform is rotatably supported for rotation about an axis of rotation. A first joining subassembly pivotally mounts the first unit on the first surface of the instrument platform for rotation about an axis spaced from and parallel to the axis of rotation. A first pair of locking devices lock the first unit in abutting relation to the first surface in locked position and release the first unit to hang freely at various angles with the first surface in unlocked position whereby the first unit is in playing position when the instrument platform is horizontal with the first surface up and in stored position, hanging from the first surface, when the instrument platform is horizontal with the first surface down. A second joining subassembly pivotally mounts the second unit on the second surface of the instrument platform for rotation about an axis spaced from and parallel to the axis of rotation. A second pair of locking devices lock the second unit in abutting relation to the second surface in locked position and release the second unit to hang freely vertically with the second surface in unlocked position whereby the second unit is in playing position when the instrument platform is horizontal with the second surface up and in stored position, hanging from the second surface, when the instrument platform is horizontal with the second surface down.