The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 1985
Filed:
Jun. 22, 1984
Applicant:
Inventors:
Kazuo Sato, Suginami, JP;
Sumio Yamaguchi, Nishitama, JP;
Shigeo Kato, Mitaka, JP;
Yasuhide Matsumura, Hachioji, JP;
Muneo Mizumoto, Tsuchiura, JP;
Sumio Okuno, Kudamatsu, JP;
Naoyuki Tamura, Kudamatsu, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118726 ; 118500 ; 118729 ; 156D / ; 156614 ; 414217 ;
Abstract
An apparatus for molecular beam epitaxy according to the present invention is so constructed that a substrate is introduced into a vacuum vessel with a substrate surface for epitaxial growth facing in the direction of gravity, and that the substrate is conveyed to and transferred into vacuum chambers for performing processes necessary for the epitaxial growth, with the substrate surface maintained in the direction of gravity and without directly touching the substrate surface.