The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 1985
Filed:
Jan. 05, 1983
Applicant:
Inventors:
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J / ;
U.S. Cl.
CPC ...
356316 ; 356417 ; 356418 ;
Abstract
A plasma monitoring method and a plasma monitor in a dry process which utilizes a plasma. Among a large number of chemical species which constitute the plasma, one or two specified chemical species suited to grasp the situation of the dry process has/have its/their plasma light/lights detected so as to obtain the three-dimensional distribution of the densities of the single specified chemical species or the ratios of the two specified chemical species in the plasma.